Atomic Force Microscopy (AFM) MultiMode 8

The Benchmark for High-Performance AFM,
Now with High-Speed ScanAsyst

The MultiMode is the world’s most field-proven atomic force
microscope (AFM), with thousands of systems installed
worldwide. Its success is based on its superior resolution and
performance, its unparalleled versatility, and its proven record of
productivity and reliability.
Today’s MultiMode 8 greatly surpasses previous generations.
Bruker’s new Peak Force Tapping™ technology has enabled
exclusive new operating modes that deliver new information,
superior ease of use, even higher performance, and new levels
of speed and productivity.
Easier Expert-Quality Results
n Bruker’s exclusive ScanAsyst® mode offers automatic
image optimization for faster, more consistent results. It will
continuously adjust scan rate, setpoint and gains to obtain
the highest quality image.
n Imaging in fluid has never been easier. There’s no need for
cantilever tuning and ScanAsyst continuously monitors the
tip-sample interaction force, thereby eliminating setpoint drift.
New, Quantitative Imaging Modes
n PeakForce QNM® enables direct mapping of nanomechanical
properties, including elastic modulus, adhesion and dissipation,
at high resolution and normal scan rates. The data channels
are quantitative and unambiguous, unlike conventional phase
imaging and some competing multi-frequency techniques.
n PeakForce TUNA™ enables quantitative conductivity mapping
on delicate samples that can’t be imaged with conventional
conductive AFM.
New Fast Scanning Technology
n ScanAsyst-HR is now available, enabling fast scanning on the
MultiMode 8. Enjoy up to 20X faster survey scan rates and up
to 6X faster scans with no loss of resolution.

Detail click HERE

Book at Microscopy Lab

Scanning Electron Microscope (SEM)

A scanning electron microscope (SEM) is a type of electron microscope that produces images of a sample by scanning the surface with a focused beam of electrons. The electrons interact with atoms in the sample, producing various signals that contain information about the surface topography and composition of the sample. The electron beam is scanned in a raster scan pattern, and the position of the beam is combined with the detected signal to produce an image. SEM can achieve resolution better than 1 nanometer. Specimens are observed in high vacuum in conventional SEM, or in low vacuum or wet conditions in variable pressure or environmental SEM, and at a wide range of cryogenic or elevated temperatures with specialized instruments.[1]

The most common SEM mode is the detection of secondary electrons emitted by atoms excited by the electron beam. The number of secondary electrons that can be detected depends, among other things, on specimen topography. By scanning the sample and collecting the secondary electrons that are emitted using a special detector, an image displaying the topography of the surface is created. Read More

Focused ion beam (FIB)

Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). However, while the SEM uses a focused beam of electrons to image the sample in the chamber, a FIB setup uses a focused beam of ions instead. FIB can also be incorporated in a system with both electron and ion beam columns, allowing the same feature to be investigated using either of the beams. FIB should not be confused with using a beam of focused ions for direct write lithography (such as in proton beam writing). These are generally quite different systems where the material is modified by other mechanisms.Read More

Field Emission Scanning Electron Microscope (FESEM)


Incorporates 4 types of detectors:
1. Lower electron detector (LED).
2. Upper electron detector (UED)
3. Upper secondary electron detector (USD)
4. Backscattered electron detector (BED)

For the UED, the secondary electron and backscattered electron dose can be changed according to the filter voltage, making it possible to select the electron energy. The USD detects the low-energy electrons that bounce off the filter. With the BED, channeling contrast can be clearly observed by detecting the low-angle backscattered electrons. The LED enables acquisition of images with a 3-dimensional appearance, including the surface roughness information from the illumination effects.


MJIIT Microscopy Lab Workshop Series 4

Invitation to 

MJIIT Microscopy Lab Workshop Series 4

(FESEM-EDS & Sample Preparation)

28-30 August 2018 

MJIIT Microscopy Lab, UTM-KL

We are pleased to invite you to MJIIT Microscopy Lab Workshop Series 4 (FESEM-EDS & Preparation) which will be held on 28th – 30th August 2018 at Microscopy Laboratory, Malaysia-Japan International Institute of Technology (MJIIT), Universiti Teknologi Malaysia, Kuala Lumpur Campus (Jalan Sultan Yahya Petra, 54100 KL), organized in cooperation with JEOL (M) SDN BHD.


About Our Workshop:


Advanced microscopy is one of the most essential techniques in micro/nano-characterization to extract important information on the specimens. Efficient uses of advancedmicroscopy equipment require not only skills in equipment operation but also sufficient knowledge on the mechanism of image-formation in micrographs as well as good experiences of practical application of analysis to research. MJIIT Microscopy Lab Workshop Series aims to assist researchers and technicians to develop their skills and knowledge in order to encourage efficient uses of microscopy equipment and advance nano-characterization in Malaysia.

   Following the successfulness of our Workshop Series 1-3, we are glad to inform that we will organize another one, which is MJIIT Microscopy Laboratory Workshop Series 4 in cooperation with JEOL (M) SDN BHD. We are focusing on the fundamental knowledge and basic operation of FESEM – EDS as well as specimen preparation. We are pleased to welcome young engineers and researchers of all related industries and universities to join the MJIIT Microscopy Lab Workshop Series-4. 

The main topics in the course are:

Workshop Series 4: (2 days and a half)

The 1st day

1) Fundamentals of FESEM and JSM-7800F Prime

2) Image formation by Secondary Electrons (SE) and Back-Scatter Electrons (BSE)

3) How to separate topological and compositional images

4) Hands-on

The 2nd day

1) Sample preparation with a sputtering coater and an ion mill (Cross Section Polisher)

2) Hands-on

The 3rd day

1) Fundamentals of EDS in SEM

2) Introduction to datum-collection

3) Hands-on

The number to be admitted: 8

The charge for registration:  RM1,000,  

          + a free coupon to use FESEM JSM7800F for 1 time-session (1-hr/1 sample)

Due date for registration: 20 Aug 2018

Application Requirement:

  1. Complete the registration form first before make the payment. We will notify you for the payment.
  2. Participation is only confirmed after payment is made.
  3. Payment is non-refundable upon cancellation.

For registration, please click here:

3 Dimensional charactirization nanomaterial using STEM

Using STEM to produce 3D

Produce the 3d using depth and overlap each image.

In 2D we dont know cubic or rhombohedral or plate like.

Precipitates shows point like contrast while dislocation can be seen a connection line from precipitates.

Need to know the distance precipitates in order to measure the distance of 3d.

By titling the sample it will produce the depth.





PIPS II ion miller

Maker: Gatan

Precision ion polishing system for precise centering, control, and reproducible of milling process.

  • X,Y stage permits alignment of argon beams to region of interest on the sample
  • Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
  • Digital optical imaging with image storage and analysis in DigitalMicrograph® software
  • 10″ color touch screen for display and control of all PIPS™ II parameters